Atomic Layer Deposition
Page d'aide sur l'homonymie Pour les articles homonymes, voir ALD.

L’Atomic Layer Deposition (ALD) est un procédé de dépôt de couches minces atomiques. Le principe consiste à exposer une surface successivement à différents précurseurs chimiques afin d'obtenir des couches ultra-minces. Il est utilisé dans l'industrie des semi-conducteurs.

L'énorme avantage de l'ALD est de pouvoir faire une monocouche sur une surface présentant un très fort rapport d'aspect (des creux et des bosses). Notamment car la réaction de CVD se déroule directement à la surface, sur une monocouche de gaz précurseurs adsorbés.


Wikimedia Foundation. 2010.

Contenu soumis à la licence CC-BY-SA. Source : Article Atomic Layer Deposition de Wikipédia en français (auteurs)

Regardez d'autres dictionnaires:

  • Atomic layer deposition — (ALD) is a gas phase chemical process used to create extremely thin coatings. The majority of ALD reactions use two chemicals, typically called s. These precursors react with a surface one at a time in a sequential manner. By exposing the… …   Wikipedia

  • Atomic Layer Deposition — Die Atomlagenabscheidung (engl. atomic layer deposition, ALD) ist ein stark verändertes CVD Verfahren zur Abscheidung von dünnen Schichten. Verschiedene Namen ein Prinzip, die Atomlagenabscheidung[1] Bezeichnung Abkürzung Atomic layer deposition… …   Deutsch Wikipedia

  • Atomic layer epitaxy — (ALE), now more generally called Atomic Layer Deposition, is a specialized form of epitaxy that typically deposit alternating monolayers of two elements onto a substrate. The crystal lattice structure achieved is thin, uniform, and aligned with… …   Wikipedia

  • Deposition (chemistry) — In chemistry, deposition is the settling of particles (atoms or molecules) or sediment from a solution, suspension and mixture or vapor onto a pre existing surface. Deposition generally results in growth of new phase and is of fundamental… …   Wikipedia

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v …   Wikipedia

  • Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some …   Wikipedia

  • Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …   Wikipedia

  • ALD — Atomic Layer Deposition (Academic & Science » Electronics) ** Alcoholic Liver Disease (Medical » Physiology) * Allied Capital Corporation (Business » NYSE Symbols) * Assistive Listening Device (Academic & Science » Electronics) * Anoxic Limestone …   Abbreviations dictionary

  • Nanoarchitectures for lithium-ion batteries — Efforts in lithium ion batteries research have been to improve two distinct characteristics: capacity and rate. The capacity of the battery to store energy can be improved through the ability to insert/extract more lithium ions from the electrode …   Wikipedia

Share the article and excerpts

Direct link
Do a right-click on the link above
and select “Copy Link”